中文摘要：

用XRD，SEM，FTIR光谱仪、UV／VIS／NIR光谱仪表征了由化学气相沉积制备的碲薄膜的结构和光学性能，结果表明碲膜的光学性能受膜的厚度、基体表面性质和膜的表面形貌的影响。沉积在裸聚乙烯箔基体上的碲膜（膜厚293nm）不仅在8-13μm光谱范围的透过率比沉积在Mn-0覆盖聚乙烯箔基体上的碲膜（膜厚216nm）的透过率高，而且还能有效地阻挡太阳光的透过，这些性能说明具有该厚度的碲膜可以应用于太阳光辐射屏与辐射制冷设备。

英文摘要：

Tellurium thin films were prepared by the chemical vapor deposition （CVD） method. The structure, surface morphology and optical properties of the Te thin films were analyzed by powder X-ray diffraction, scanning electron microscopy, FTIR transmission, UV/VIS/NIR transmission and reflectance. The results show that the optical properties of films are influenced by many factors such as film thickness, surface properties of substrate and surface morphology offilm. The Te films depositing on bare polyethylene as thick as 293 nm have higher IR transmission than depositing on Mn-O coated polyethylene （film thickness 216 nm） across the full 8- 13μm band and can effectively block up the transmission of the sun-ray, which indicates that Te films deposition on bare polyethylene with thickness of 293 nm can be used as good solar radiation shields and radiative cooling devices.