Microstructure and dislocation of epitaxial InN films revealed by high resolution x-ray diffraction
- ISSN号:0021-8979
- 期刊名称:Journal of Applied Physics
- 时间:0
- 页码:023504-023504
- 语言:英文
- 相关项目:获得高质量低位错密度GaN衬底的生长新思路及相关关键问题研究
作者:
Lu, H.|Schaff, W. J.|Xie, Z. L.|Shi, Y.|Li, Y.|Liu, Q. J.|Chen, P.|Han, P.|Gu, S. L.|Liu, B.|Zheng, Y. D.|Zhang, R.|Zhang, Z.|Xiu, X. Q.|