制备了有机紫外光探测器(OUV-PD),器件结构为ITO/m-MTDATA(30nm)/m-MTDATA:BAlq(40-60nm,1∶1)/BAlq(40nm)/LiF(1nm)/Al(100nm),并研究了施加Liq、TPBi、Bphen和Zn(4-MeBTZ)2为阴极缓冲层时对器件性能的影响。实验结果表明,OUV-PD光响应与阴极缓冲层厚度和电子传输性能紧密相关,在1.05mW/cm2的波长为365nm UV光照射下,响应度最大值分别达到218mA/W、247mA/W、305mA/W和283mA/W。
Organic ultraviolet photodetector(OUV-PD)has been specially concerned due to the advantages of wide range of material selection,low cost,flexibility and large-area manufacturing.The OUV-PD with structure of ITO/m-MTDATA(30nm)/m-MTDATA:BAlq(40-60 nm,1∶1)/BAlq(nm 40)/LiF(1nm)/Al(100nm)was prepared.The effects of Liq,TPBi,Bphen and Zn(4-MeBTZ)2as cathode buffer layers on the performance of OUV-PD are studied.The experimental results show that the photoresponse of OUV-PD is closely related to the thickness and electron mobility of cathode buffer layer.Under an illumination of 365 nm UV light with power of 1.05mW/cm2,the maximum values of response are 218mA/W,247mA/W,305mA/W and 283mA/W,respectively.