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Morphology dependence of cathodoluminescence from cubic boron nitride films deposited by chemical va
  • ISSN号：0021-8979
  • 期刊名称：Journal of Applied Physics
  • 时间：0
  • 页码：124915-1-124915-5
  • 语言：英文
  • 相关项目：氟和离子轰击在立方氮化硼化学气相合成中的交互作用机理
作者： Lau, WM|Ong, HC|Matsumoto, S|Yu, J|Wong, KY|
同期刊论文项目
氟和离子轰击在立方氮化硼化学气相合成中的交互作用机理
期刊论文 10 专利 3
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Thermal stability of cubic boron nitride films deposited by chemical vapor deposition
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