中文摘要：

介绍了用磁控溅射法制备Au／Gd（金／钆）多层膜的初步实验结果。在摸索出的工艺条件下，采用计算机定时控制膜厚的方法，按照设计的周期结构（设计周期厚度10nm．Au／Gd=5nm／5nm，总周期数为25）制备了界面清晰、表面光滑的多层膜样品。X—Ray衍射仪小角衍射测试的周期厚度为9、95nm.和设计值十分吻合，原子力显微镜（AFM）的检测表明，薄膜的表面粗糙度小于1、7nm。

英文摘要：

The experiment result of fabrication Au/Gd muhilayer film by magnetron sputtering is described in this paper. Using computer controlled timing method, designed period structure（ d = 10nm, Au/Gd = 5nm/5nm, n = 25 ）has been automatically deposited on Si surface under appropriate working conditions. The result of X-Ray small angle diffraction and atom force microscope test show that the film＇s period depth is 9. 95nm and the film＇s surface roughness is less than 1.7nm