采用电化学沉积法在不锈钢衬底上制备了碲化铋(Bi2Te3)化合物热电薄膜,并利用XRD(X线衍射分析)、SEM(扫描电镜)和AFM(原子力显微镜)对薄膜进行物相分析和形貌观察.首先通过循环伏安法分别对Bi3+和HTeO2+以及他们共存的HNO3溶液进行了测试,确定了Bi2Te3的电化学生长为互诱导二元共沉积过程.然后在-50 mV电位,20 rmA.cm-2电流密度进行电沉积得到Bi2Te3多晶薄膜,XRD分析显示薄膜沿着(110)晶向存在一定程度的择优取向生长.进一步改变沉积电流密度发现,提高沉积电流密度使薄膜晶粒尺寸变小.
Bi2 Te3 thermoelectric films were prepared by electrodeposition on stainless steel substrates, the structure and morphology of the films were characterized by XRD, SEM and AFM. Firstly, cyclic vol- tammogram was used to study the Bi3+, HTeO+ and their coexistent solutions in HNOa. The electro- chemistry growth of Bi2 Te3 was confirmed to be mutually induced codeposition process. Then Bi2 Te3 poly- crystalline films were prepared at potential of -- 50 mV with current density of 20 mA ~ cm-2 , and the films were found to be (110) preferential orientation. It was also found that increasing electrodepositon current densities would reasult in smaller grain sizes.