中文摘要：

采用直流磁控溅射技术制备超薄Au膜,用原子力显微镜观察薄膜的表面形貌。功率谱密度计算结果显示,随着溅射时间增加,高频段曲线拟合直线的斜率增大,相应的分形维数从2.579减小到2.500;而低频段曲线拟合直线的斜率减小,相应的分形维数由2.607增大到2.819,薄膜表面形貌存在多尺度行为。多重分形谱结果表明,随着溅射时间的增加,分形谱宽Δα从0.051增大到0.118,说明薄膜表面高度分布范围愈来愈宽,表面粗糙度愈来愈大,与rms研究结果一致。样品的Δf均〉0,说明样品表面最高峰位的数目均多于最低谷位的数目。

英文摘要：

Surface topography of ultrathin Au films with different thicknesses,prepared by direct current magnetron sputtering technique,was analyzed by atomic force microscopy.Power spectral density was used to calculate fractal dimension of the ultrathin Au films.The results show that as sputtering time increases,the fractal dimension of Au films decreases from 2.579 to 2.500 in high frequency region,and that of Au films increase from 2.607 to 2.819 in low frequency region.The surface topography of Au films has multi-scale feature.Multifractal spectra show that the spectrum width α of Au films changes from 0.051 to 0.118,indicating that surface roughness of Au films increases with increasing sputtering time.The f of samples are positive,suggesting that the number of highest peak sites greater than that of lowest valley sites.