中文摘要：

Atom lithography with chromium can be utilized to fabricate a pitch standard,which is directly traceable to the wavelength of the laser standing waves. The result of a calibrated commercial AFM measurement demonstrates that the pitch standard is(212.8±0.1) nm with a peak-to-valley-height(PTVH) better than 20 nm. The measurement results show the high period accuracy of traceability with the standing laser wavelength(λ /2 = 212.78 nm). The Cr nano-grating covers a 1000 μm×500 μm area, with a PTVH better than 10 nm. The feature width broadening of the Cr nanostructure has been experimentally observed along the direction of the standing waves. The PTVH along the Gaussian laser direction is similar to a Gaussian distribution. Highly uniform periodic nanostructures with a big area at the millimeter scale, and the surface growth uniformity of the Cr nano-grating, show its great potential in the application of a traceable pitch standard at trans-scales.更多还原

英文摘要：

Atom lithography with chromium can be utilized to fabricate a pitch standard, which is chrectly traceable to me wavelength of the laser standing waves. The result of a calibrated commercial AFM measurement demonstrates that the pitch standard is （212.8±0.1） nm with a peak-to-valley-height （PTVH） better than 20 nm. The measurement results show the high period accuracy of traceability with the standing laser wavelength （λ/2 = 212.78 nm）. The Cr nano-grating covers a 1000μm×500 μm area, with a PTVH better than 10 nm. The feature width broadening of the Cr nanostructure has been experimentally observed along the direction of the standing waves. The PTVH along the Gaussian laser direction is similar to a Gaussian distribution. Highly uniform periodic nanostructures with a big area at the millimeter scale, and the surface growth uniformity of the Cr nano-grating, show its great potential in the application of a traceable pitch standard at trans-scales.