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Effects of polarization on four-beam laser interference lithography
  • ISSN号：0003-6951
  • 期刊名称：Applied Physics Letters
  • 时间：2013.2.28
  • 页码：0819031-0819035
  • 相关项目：激光干涉诱导电化学制造半导体纳米阵列结构研究
作者： Ziang Zhang|Yong Yue|Dayou Li|Carsten Maple|
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