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Enhancement in solar hydrogen generation efficiency using InGaN photoelectrode after surface roughening treatment with nano-sized Ni mask
  • ISSN号:1674-1056
  • 期刊名称:《中国物理B:英文版》
  • 时间:0
  • 分类:O484[理学—固体物理;理学—物理] TP311.52[自动化与计算机技术—计算机软件与理论;自动化与计算机技术—计算机科学与技术]
  • 作者机构:[1]National Laboratory of Solid Microstructures, Nanjing University, Nanjing 210093, China, [2]Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing National Laboratory of Microstructures, Nanjing University, Nanjing 210093, China, [3]Ecomaterials and Renewable Energy Research Center (ERERC), Department of Physics, Nanjing University, Nanjing 210093, China
  • 相关基金:Project supported by the Special Funds for Major State Basic Research Project of China (Grant Nos. 2011CB301900, 2012CB619304, and 2010CB327504), the Hi-tech Research Project of China (Grant No. 2011AA03A103), the National Nature Science Foundation of China (Grant Nos. 60990311, 61274003, 60936004, and 61176063), the Program for New Century Excellent Talents in University of China (Grant No. NCET-11-0229), the Natural Science Foundation of Jiangsu Province of China (Grant No. BK2011010), the Funds of Key Laboratory of China (Grant No. 9140C140102120C14), and the Research Funds from NJU-Yangzhou Institute of Opto-electronics of China.
中文摘要:

A significant enhancement in solar hydrogen generation efficiency has been achieved by inductive coupled etching(ICP) surface roughening treatment using nano-sized nickel mask. As much as 7 times improvement of photocurrent is demonstrated in comparison with a planar one fabricated from the same parent wafer. Under identical illumination conditions in HBr solution, the incident photon conversion efficiency(IPCE) shows an enhancement with a factor of 3, which even exceed 54% at 400 nm wavelength. We believe the enhancement is attributed to several facts including improvement in absorption, reacting area, carrier localization and carrier lifetime.

英文摘要:

A significant enhancement in solar hydrogen generation efficiency has been achieved by inductive coupled etching (ICP) surface roughening treatment using nano-sized nickel mask. As much as 7 times improvement of photocurrent is demonstrated in comparison with a planar one fabricated from the same parent wafer. Under identical illumination conditions in HBr solution, the incident photon conversion efficiency (IPCE) shows an enhancement with a factor of 3, which even exceed 54% at 400 nm wavelength. We believe the enhancement is attributed to several facts including improvement in absorption, reacting area, carder localization and carrier lifetime.

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期刊信息
  • 《中国物理B:英文版》
  • 中国科技核心期刊
  • 主管单位:中国科学院
  • 主办单位:中国物理学会和中国科学院物理研究所
  • 主编:欧阳钟灿
  • 地址:北京 中关村 中国科学院物理研究所内
  • 邮编:100080
  • 邮箱:
  • 电话:010-82649026 82649519
  • 国际标准刊号:ISSN:1674-1056
  • 国内统一刊号:ISSN:11-5639/O4
  • 邮发代号:
  • 获奖情况:
  • 国内外数据库收录:
  • 被引量:406