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Structural and optical properties of nitrogen-incorporated HfO2 gate dielectrics deposited by reacti
  • ISSN号：0169-4332
  • 期刊名称：Applied Surface Science
  • 时间：0
  • 页码：8483-8488
  • 语言：英文
  • 相关项目：纳米场效应晶体管栅极材料的探索-Al、N共掺杂Y2O3超薄膜的制备和物性研究
作者： He, G.|Fang, Q.|Zhang, L. D.|Zhang, J. P.|Li, G. H.|
同期刊论文项目
纳米场效应晶体管栅极材料的探索-Al、N共掺杂Y2O3超薄膜的制备和物性研究
期刊论文 14 会议论文 3 著作 1
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