中文摘要：

采用Ti-Al-Zr合金靶和Cr靶,用多弧离子镀技术在WC-8%Co硬质合金基体上沉积（Ti,Al,Zr,Cr）N多元氮化物膜。分析了薄膜的成分、形貌、粗糙度和结构,研究了薄膜的显微硬度、膜/基结合力和抗高温氧化性能。结果表明,获得的多元氮化物膜仍是B1-NaCl型TiN面心立方结构;适当控制偏压条件可以改善薄膜的表面形貌;在不同的偏压条件下,（Al＋Zr＋Cr）/（Ti＋Al＋Zr＋Cr）的成分比为0.41～0.43,当其比值趋于0.4时,薄膜的显微硬度和膜/基结合力达到最大值3600HV0.01和200N;同时薄膜的抗高温氧化性能提高,最高温度可达700℃左右。

英文摘要：

Using Ti-Al-Zr target and pure Cr target,the multi-component （Ti,Al,Zr, Cr）N films were deposited on the substrates of cemented carbide（ WC-8% Co）by multi-arc ion plating technique. The composition, morphology,roughness and structure of the films were analyzed. The micro-hardness,binding force between the fihns and the substrates, as well as the high temperature oxidation resistance were studied. The results show that the multi-component nitride films still demonstrate the TiN （B1-NaCl）face-centered cubic structure. The surface morphologies of the films can be effectively improved at the appropriate bias voltage. At different bias voltages, the atomic ratio of（ Al ＋ Zr ＋ Cr）/（Ti ＋ Al ＋ Zr ＋ Cr） varies between 0. 41 and 0.43. While the atomic ratio tends to 0.4, the micro-hardness of the films and the binging fierce between the films and the substrates reach up to 3600 HV0. 01 and 200 N, respectively. Furthermore, the high temperature oxidation resistance of the films is enhanced,and the maximum temperature is up to 700 ℃.