采用热丝和射频等离子体复合化学气相沉积技术,用旋涂法制备负载催化剂的硅片衬底,以CH4为碳源制备出取向碳纳米管阵列薄膜.利用扫描电子显微镜对不同还原时间和不同Ni(NO3)2浓度下制备的催化剂基片和取向碳纳米管阵列薄膜进行形貌分析,用透射电子显微镜和拉曼光谱对碳纳米管进行表征.结果表明,在H2-N2气氛中热还原后硅片上的催化剂粒径均匀,排列致密,利用该法制备的碳纳米管为竹节型多壁碳纳米管,管径分布均匀,管长约5μm.碳纳米管阵列薄膜垂直于硅片衬底生长,生长排列均匀致密,具有良好的取向性.
Aligned carbon nanotubes array was synthesized by plasma-enhanced hot filament chemical vapor deposition by using nickel nitrate solution-covered silicon as catalyst substrate. The morphology and structure of the carbon nanotubes array were characterized by scanning electron microscope (SEM) and transmission electron microscope and Raman spectrum analysis. SEM images show that the catalyst particles after heat treated in H2 - N2atmosphere are well-dispersed with even particle size. The carbon nanotubes array prepared by this method is vertically aligned and the carbon nanotubes are bamboo-like multi-walled carbon nanotubes, with the length about 5μm.