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Pixelated source and mask optimization for immersion lithography
  • ISSN号：1084-7529
  • 期刊名称：Journal of the Optical Society of America A-Optics
  • 时间：2013.1.1
  • 页码：112-123
  • 相关项目：超大数值孔径光刻成像与图形保真技术研究
作者： Ma, Xu|Han, Chunying|Li, Yanqiu|Dong, Lisong|Arce, Gonzalo R.|
同期刊论文项目
超大数值孔径光刻成像与图形保真技术研究
期刊论文 70 会议论文 20 专利 75
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