采用严格耦合波理论和增强透射矩阵方法,对SiO2纳米柱阵列太阳电池减反射层进行了优化设计。设计的纳米柱阵列结构在300~1 200 nm波长范围内,可实现在太阳光0°~60°的入射范围内平均加权反射率接近1%。通过与以太阳光30°入射优化设计的新型纳米SiO2单层和SiO2/TiO2双层减反射膜相比,发现优化设计的SiO2纳米柱阵列减反射层结构在宽波段、宽入射角度范围内能更有效地减少光反射,从而提高太阳电池的转换效率、降低生产成本。
The SiO2 nanopillar array antireflection layer for solar cells was optimized by rigorous coupled wave analysis(RCWA) and the enhanced transmission matrix method.When the incident angle is in the range from 0° to 60°,the weighted average reflectivity is close to 1% for the designed nanopillar array structure in 300~1 200 nm wavelength.Compared with other novel nanostructures,such as SiO2 single-layer and SiO2/TiO2 double-layer antireflection coatings,it is found that the SiO2 nano-pillar array structure can reduce the light reflection more effectively,especially in the wide-band and wide incident angles scope.This will be propitious to improve the conversion efficiency and reduce the production costs of solar cells.