中文摘要：

为了解决纳米试样超光滑表面的制备问题，将能提供稳定声压场的声悬浮抛光技术应用到流体抛光中，开展了声压场和磨粒流场之间关系的分析。利用Matlab／PDE532具箱对抛光装置内部声压仿真的方法，对比不同反射端对抛光槽声压场的影响，优化了适合抛光的反射端形状尺寸和发射端与反射端之间的距离。利用PIV测试分析了磨粒流场与声压场的相关性，建立了声压场和磨粒流场之间的关系。试验结果表明，磨粒的运动方向与声压等势线大致相同，而且磨粒的最大速度与声压大小成正比。

英文摘要：

Aiming at solving the problem of the sample preparation of high quality, a new way of polishing named acoustic suspension polishing considering the stable sound pressure provided by the acoustic suspension was investigated. The sound pressure inside the polishing equipment was simulated by the PDE toolbox of the software Matlab. The effects of the sound pressure field in the polishing tank were compared by different reflector ends. The shape and the dimension of the ultrasonic reflector are suitable for polishing, the distance between the ultrasonic emission end and the ultrasonic reflector were optimized. With the help of the PIV, the correlation between the abrasive flow and the sound pressure field was analyzed. The results indicate that the direction abrasive moves are approximately the same as the equipotential line,while the biggest velocity of the abrasive is proportional to the sound pressure.