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Evolution of morphology in electrodeposited nanocrystalline Co-Ni films by in-situ high magnetic fie
  • ISSN号：0039-9140
  • 期刊名称：Talanta
  • 时间：2013.6.6
  • 页码：66-70
  • 相关项目：强磁场辅助脉冲电沉积法生长Co基磁性薄膜的基础研究
作者： Li, Donggang|Levesque, Alexandra|Franczak, Agnieszka|Wang, Qiang|He, Jicheng|Chopart, Jean-Paul|
同期刊论文项目
强磁场辅助脉冲电沉积法生长Co基磁性薄膜的基础研究
期刊论文 17 会议论文 2 专利 2
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