欢迎您！东篱公司
退出
-
申报数据库
-
立项数据库
-
成果数据库
-
项目获奖数据库
中文摘要：
为保证投影光刻物镜的成像性能并降低制造成本,提出了一种更全面可靠的公差分析方法。该方法在以波像差均方根（RMS）值作为评价标准的传统分析方法基础上,添加波像差峰谷（P-V）值作为评价指标,并据此选择合理的补偿器组合。在系统波像差的RMS值和P-V值均满足要求的情况下,采用了较少的补偿器,从而有效地降低了系统的制造难度和成本。结合实验室设计的一套90nm投影光刻物镜进行了公差分析和补偿器优选。结果表明,利用该方法选择的7个补偿器,使得系统在97.7%置信区间内,全视场波像差的RMS值≤0.0412λ,P-V值≤0.2469λ,满足了90nm投影光刻物镜的像质要求。
英文摘要：
A simple and reliable method of tolerance analysis is proposed to ensure the performance of lithographic projection lens and minimize the manufacturing costs of lithographic projection lens.This method defines P-V wavefront error as merit function based on RMS wavefront error,and selects the optimal compensators.Compared to present methods,this method decreases mechanical complexity and minimizes the manufacturing costs by adopting less compensators,with both RMS wavefront error and P-V wavefront error achieving the requirement.As an example the method is applied to a refractive projection lens for 90nm resolution lithography projection lens designed by us.The results show that,only with 7compensators,RMS wavefront error and P-V wavefront error at 97.7%probability are less than 0.0412λand 0.2469λ,respectively.In conclusion,this method is able to meet the performance requirement of lithographic projection lens.
同期刊论文项目
同项目期刊论文
Even aberration measurement of lithographic projection optics based on intensity difference of adjac
High spatial resolution zonal wavefront reconstruction with improved initial value determination sch
Evolution properties of the intensity distribution of an anisotropic Gaussian Schell-model beam in a
Far-zone polarization distribution properties of partially coherent beams with non-uniform source po
Generalized zonal wavefront reconstruction for high spatial resolution in lateral shearing interfero
Polarization distribution control of anisotropic electromagnetic Gaussian-Schell model beams on free
Modal wavefront reconstruction based on Zernike polynomials for lateral shearing interferometry: Com
Use of numerical orthogonal transformation for the Zernike analysis of lateral shearing interferogra
In situ aberration measurement technique based on multi-illumination settings and principal componen
Practical application of aerial image by principal component analysis to measure wavefront aberratio
Analysis and optimization approaches for wide-viewing-angle lambda/4 plate in polarimetry for immers
Measurement technique for characterizing odd aberration of lithographic projection optics based on d
Polarization effects induced by the bi-layer attenuated phase-shiftmask and their impacts on near-fi
Improving wavefront reconstruction accuracy by using integration equations with higher-order truncat
期刊信息
位置：