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Numerical results for the Ar and CF4 mixture gas in a dual frequency capacitively coupled plasma usi
  • 期刊名称：PHYSICS OF PLASMAS
  • 时间：0
  • 页码：043510-1-043510-8
  • 语言：英文
  • 相关项目：低气压多频等离子体与材料表面相互作用
作者： Zhen-Hua Bi|Zhi-Cheng Li|Xiang Xu|You-Nian Wang|Zhong-Ling Dai|
同期刊论文项目
低气压多频等离子体与材料表面相互作用
期刊论文 80 会议论文 8
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