以邻苯二甲酸二甲酯(DMP)作为模型污染物,研究了不同结构的钛基体对掺硼金刚石薄膜(Ti/BDD)电极电催化性能的影响.结果表明,三维多孔电极为氧化还原反应提供了更多的反应活性位点,表现出更快的电子传递速率.通过循环伏安法和线性扫描法验证了DMP在BDD电极上的电催化氧化行为属于直接电氧化过程,且在低浓度下近似为一级反应,DMP浓度较高时会在BDD电极表面发生成膜现象.在不同浓度的DMP溶液中使用平板Ti/BDD电极及多孔Ti/BDD电极进行直接电催化氧化时,DMP的电催化氧化过程与理论推断一致;多孔电极由于其电活性面积的优势在COD和DMP的去除方面均优于平板电极.
The effect of structure of the titanium substrate on the electrocatalytic activity of boron-dopped diamond film( BDD) electrode was studied with dimethyl phthalate( DMP) as an organic pollutant mode. 3D porous Ti / BDD electrode can provide more reactive sites for the electrochemical reaction and has faster electron transfer rate compared with planar Ti / BDD electrode. The electrooxidation behavior of DMP on BDD electrodes is direct oxidation based on the results of cyclic voltammetry and liner sweep curves and presented pseudo first-order kinetic at low DMP concentration. Meanwhile,the formation of polymer film was observed at high DMP concentration. Due to the high active area,3D porous Ti / BDD electrode revealed superior performance in the direct electrooxidation of DMP. In terms of chemical oxygen demand( COD) and removal rate when employing different concentrations of DMP,the experimental results on planar Ti / BDD and 3D-Ti /BDD electrodes coincided with the theory proposed.