中文摘要：

研究室温下在熔盐体系中用电沉积方法于铜基体上沉积单一金属钆，分析了沉积液中主盐的含量、电流密度、电沉积时间及沉积液的pH值选择等工艺参数对沉积薄膜的形貌和金属Gd含量的影响。经X射线能谱仪（EDS）测定，其中Gd的质量分数为93．56％；经扫描电子显微镜（SEM）观察所得沉积薄膜为均匀、光滑、致密的银白色沉积膜；经X射线衍射仪（XRD）分析，所得沉积薄膜的晶体结构为立方晶；通过X射线光电子能谱仪（XPS）对沉积薄膜表面价态分析，证明所得沉积薄膜为单一稀土金属钆。用聚乙烯醇保护膜涂覆可以使稀土沉积薄膜免于氧化。

英文摘要：

The rare earth metal Gd film on Cu substrate was fabricated by electrodeposition in ureaNaBr-KBr-formamide solution under isolation of oxygen. The effects of the concentration of GdCl3 and the current density and electrodeposition time and pH on the morphology and Gd content of the deposited film were investigated. The results obtained by XRD, SEM, EDS and XPS show that the deposited film contains metal Gd mainly（93. 56%, mass fraction） and a few oxygen. The film is dense, homogenous and smooth with silvery white colour. Too low or too high current density leads to dark grey, porous and rough deposited film. The Gd content in the film increases and then decreases as the current density increases. A polyvinyl alcohol film was deposited on the Gd film for protection of oxidation.