采用化学气相沉积法在镀金硅片上制备出了大量直径均匀、长度大于100肿的单晶纳米硅丝。采用场发射扫描电镜(FESEM)、能谱分析(EDX)、透射电镜(TEM)和拉曼光谱(Rarnan)对样品进行了表征和分析,并对超长纳米硅丝的生长机理进行了讨论。
A large amount of single crystal silicon nanowires are synthesized on gold-coated silicon wafers by chemical vapor deposition (CVD). The lengths of the silicon nanowires are more than 100 micrometers. The samples are characterized by field emission scanning electron microscopy (FESEM), transmission electron microscopy (TEM), energy dispersive x-ray detector (EDX) and Raman spectrum. The growth mechanism of the ultra-long silicon nanowires was also discussed.