中文摘要：

基于密度泛函理论的第一性原理计算，研究了硅烯饱和吸附碱金属元素原子的稳定性、微观几何结构和电子性质，并与纯硅烯及其饱和氢化结构进行了对比分析．研究发现复合物SiX（X=Li，Na，K，Rb）的形成能都是负的，相对于纯硅烯来说可以稳定存在．Bader电荷分析表明，电荷从碱金属原子转移至硅原子．从成键方式来看，硅烯与氢原子形成共价键，而与碱金属原子之间形成的键主要是离子性成键，但还存在部分共价关联成分．能带计算表明，锂原子饱和吸附在硅烯形成的复合物SiLi是直接带隙的半导体，带隙大小为0．34eV．其他碱金属饱和吸附在硅烯上形成的复合物都表现为金属性．

英文摘要：

Based on density functional first-principles calculations, we study the stability, micro-geometry, and electronic properties of alkali metal atoms adsorbed on silicene, and perform the comparison between pure and hydrogen-saturated silicenes. We found that all the formation energies of SiX（X = Li, Na, K and Rb） are negative, indicating that the relative structural stability of these new compounds is higher than silicene. Bader charge analysis shows that electric charge is transferred from Si atoms to H atoms in Sill compound, but in SiX the direction of charge transfer is opposite, i.e., the charge is transferred from alkali metal atoms to Si atoms. From the viewpoint of chemical bonding, it can be regarded that valence bond is formed between Si atoms and H atoms, and the bonds between Si and alkali metal atoms are mainly ionic, but there exists covalent contribution. From the band structure calculations, it is also found that the new type compound SiLi is a semiconductor with a direct band gap of 0.34 eV; however, all the other compounds of SiX（X = Na, K and Rb） exhibit metallic property.