电弧离子镀所制备薄膜中的大颗粒缺陷是研究热点之一。本文对其清除方法进行了概述,主要包括阻挡过滤、电场抑制、工艺优化和磁场消除等方法,并对其工作原理、发展历程和未来研究的方向进行总结,比较了各种方法存在的优缺点。最终提出了多级磁场直管磁过滤装置和脉冲偏压电场组合的电弧离子镀方法。
The macroparticles defects in film prepared by arc ion plating process are research hotspot in recent years. In this paper, the removal methods for macroparticles are summarized, which include shielded filter, electric field inhibition, processing optimization and magnetic removal. And the operating principle, development process and future research directions are summarized.Then, the advantages and disadvantages of various methods are compared. At last, a new arc ion plating method combining the multistage magnetic straight magnetic filter and pulsed bias electric field is proposed.