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Surface morphology and magnetic anisotropy of obliquely deposited Co/Si (111) films (vol 97, 022507,
  • ISSN号：0003-6951
  • 期刊名称：Applied Physics Letters
  • 时间：0
  • 页码：6416-6421
  • 语言：英文
  • 相关项目：磁性金属硅化物超薄膜中的厚度诱导金属－半导体转变机理研究
作者： Fang, YP He, W Liu, HL Zhan, QF Du, HF Wu, QO Yang|
同期刊论文项目
磁性金属硅化物超薄膜中的厚度诱导金属－半导体转变机理研究
期刊论文 17 会议论文 3
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