对于高分子薄膜材料,由于表面分子处于与本体不同的环境中,所以高分子薄膜的很多性质与本体的差别很大。这就使得高分子薄膜的很多应用,例如涂层技术、吸附、选择性渗透膜以及光电器件等^[1,2],都与薄膜的表面性质有密不可分的关系,因此,对于高分子薄膜表面性质的研究报道很多。研究方法包括原子力显微镜(AFM)^[3-5]、
Degradation and its temperature dependence of poly ( methyl methacrylate) (PMMA) in the blend film of PMMA/SAN were investigated via in-situ X-ray photoelectron spectroscopy (XPS). The results show that thermal degradation of PMMA takes place at 185, 130, 80℃ and even room temperature due to the existence of monochromatic X-ray. Furthermore, the degradation rate depends crucially on the experiment temperature.