Effects of Tailed Pulse-Bias on Ion Energy Distributions and Charging Effects on Insulating Substrates
- ISSN号:1009-0630
- 期刊名称:《等离子体科学与技术:英文版》
- 时间:0
- 分类:TN44[电子电信—微电子学与固体电子学] O536[理学—等离子体物理;理学—物理]
- 作者机构:[1]School of Physics and Optoelectronic Technology, Dalian University of Technology,Dalian 116024, China
- 相关基金:supported by National Natural Science Foundation of China (No. 11375040) and the Important National Science & Technology Specific Project of China (No. 2011ZX02403-001)
关键词:
离子能量分布, 脉冲偏压, 充电效应, 绝缘衬底, 智能电子设备, 流体模型, 补偿方法, 充电效果, sheath, IEDs, tailed pulse-bias waveform, hybrid model, charging effect