位置:成果数据库 > 期刊 > 期刊详情页
High-performance Sb:SnO2 Compact Thin Film Based on Surfactant-free and Binder-free Sb:Sn3O4 Suspension
  • ISSN号:1005-0302
  • 期刊名称:《材料科学技术学报:英文版》
  • 分类:TN304.21[电子电信—物理电子学] TQ423[化学工程]
  • 作者机构:[1]College of Chemical and Material Engineering, Quzhou University, quzhou 324000, China, [2]Faculty of Information Science and Engineering, Ningbo University, Ningbo 315211, China, [3]Ningbo Institute of Material Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
  • 相关基金:This work was supported Foundation of China (Nos. by the National Natural Science 21377063, 51102250, 21203226,21205127, 21271116 and 21476127), and the Personnel Training Foundation of Quzhou University (No. BSYJ201412).
中文摘要:

Surfactant-free and binder-free antimony-doped tin oxide(ATO) transparent conducting thin films were fabricated through spin coating and rapid annealing processes,in which nanosheets were assembled into a compact structure via self-contracting high pressure.The mechanism of this compact thin film formation was further proposed and analyzed.The compact ATO thin film had a low root mean square(RMS) roughness of 5.03 nm.This surfactant-free and binder-free compact ATO thin film delivered low resistivity of 3.04×10-2 Ω cm,stable resistivity which only increased 13%after exposing in 65%RH air for half a month,high transmittance of 92.70%at 550 nm,and high band gap energy of 4.07 eV.This effective strategy will provide new insight into the synthesis of low-cost and high-performance compact thin films.

英文摘要:

Surfactant-free and binder-free antimony-doped tin oxide (ATO) transparent conducting thin films were fabricated through spin coating and rapid annealing processes, in which nanosheets were assembled into a compact structure via self-contracting high pressure. The mechanism of this compact thin film for- mation was further proposed and analyzed. The compact ATO thin film had a low root mean square (RMS) roughness of 5.03 nm. This surfactant-free and binder-free compact ATO thin film delivered low resistivity of 3.04 × 10^-2 Ω cm, stable resistivity which only increased 13% after exposing in 65% RH air for half a month, high transmittance of 92.70% at 550 nm, and high band gap energy of 4.07 eV. This effective strategy will provide new insight into the synthesis of low-cost and high-performance compact thin films.

同期刊论文项目
同项目期刊论文
期刊信息
  • 《材料科学技术学报:英文版》
  • 中国科技核心期刊
  • 主管单位:中国科协
  • 主办单位:中国金属学会
  • 主编:
  • 地址:中国沈阳文化路72号
  • 邮编:110016
  • 邮箱:
  • 电话:024-83978208
  • 国际标准刊号:ISSN:1005-0302
  • 国内统一刊号:ISSN:21-1315/TG
  • 邮发代号:
  • 获奖情况:
  • 国家“双百”期刊
  • 国内外数据库收录:
  • 俄罗斯文摘杂志,美国化学文摘(网络版),荷兰文摘与引文数据库,美国工程索引,美国剑桥科学文摘,美国科学引文索引(扩展库),日本日本科学技术振兴机构数据库,中国中国科技核心期刊
  • 被引量:474