采用含钯的催化浆料活化法,实现了陶瓷表面的局部化学镀铜。扫描电子显微镜观察结果表明均匀分散的钯纳米颗粒起到了催化铜沉积的作用,镀铜层光滑平整、颗粒大小均匀。X-射线光电子能谱(XPS)和X.射线衍射(xRD)测试结果表明镀层是具有晶态结构的纯铜镀层。对化学镀铜后的陶瓷电子元件进行物理性能和电性能测试,其结果均满足工业要求。
The localized electroless copper plating on the surface of ceramics was realized by activation method using catalytic paste containing palladium. It could be seen from scanning electron microscope (SEM) that palladium nanoparticles are uniformly dispersed on the surface of ceramics as nucleation centers in the deposition of copper. The copper layer presentes smooth with uniform particle size. The results characterized by X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) show that the films are pure copper coatings with a typical crystal structure. The physical properties and electronic performance of prepared electronic components all meet the industrial requirements.