位置:成果数据库 > 期刊 > 期刊详情页
Conceptual designs of a laser plasma accelerator-based EUV-FEL and an all-optical Gamma-beam source
  • ISSN号:2095-4719
  • 期刊名称:《高功率激光科学与工程:英文版》
  • 分类:TN248[电子电信—物理电子学]
  • 作者机构:Center for Relativistic Laser Science, Institute for Basic Science (IBS), Gwangju 500-712, Republic of Korea
  • 相关基金:supported by the National Natural Science Foundation of China (Project No. 51175324);supported by IZEST, Ecole Polytechnique, France,Shanghai Jiao Tong University, Institute of Physics, CAS, China;the Center for Relativistic Laser Science, Institute for Basic Science (IBS), Korea
作者: Kazuhisa Nakajima
中文摘要:

Recently, intense research into laser plasma accelerators has achieved great progress in the production of high-energy,high-quality electron beams with Ge V-level energies in a cm-scale plasma. These electron beams open the door for broad applications in fundamental, medical, and industrial sciences. Here we present conceptual designs of an extreme ultraviolet radiation source for next-generation lithography and a laser Compton Gamma-beam source for nuclear physics research on a table-top scale.

同期刊论文项目
同项目期刊论文
期刊信息
  • 《高功率激光科学与工程:英文版》
  • 主管单位:中国科学院
  • 主办单位:中国科学院上海光学精密机械研究所 中国光学学会
  • 主编:林尊琪
  • 地址:
  • 邮编:
  • 邮箱:
  • 电话:
  • 国际标准刊号:ISSN:2095-4719
  • 国内统一刊号:ISSN:31-2078/O4
  • 邮发代号:
  • 获奖情况:
  • 国内外数据库收录:
  • 美国化学文摘(网络版)
  • 被引量:7