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体心立方金属W薄膜晶体取向的膜厚尺寸效应及其表面映射
  • 期刊名称:物理学报,2007, 56, 7248-7254
  • 时间:0
  • 分类:O484.5[理学—固体物理;理学—物理]
  • 作者机构:[1]四川大学原子核科学技术研究所,成都610064, [2]西安交通大学金属材料强度国家重点实验室,西安710049
  • 相关基金:国家自然科学基金(批准号:50771069); 国家重点基础研究发展规划(批准号:2004CB619302)资助的课题.
  • 相关项目:基于统计学习模型的金属Cu互连体系扩散阻挡层性能的表征
中文摘要:

体心立方W膜(110)织构系数T110的变化存在非单调的厚度尺寸效应,这依赖于薄膜中晶粒形核和长大时表面能和应变能的相互作用,薄膜表面结构演变反映了两者的竞争过程.应用小波变换结合分形几何描述薄膜表面结构各向异性行为,用此法构建了薄膜织构系数T110与表面结构各向异性的关系,表明薄膜晶体取向存在表面映射.

英文摘要:

Body-centered cubic (BCC) W films of different thickness were deposited on Si(100) substrate by magnetron sputtering and then annealed in vacuum at 400 ℃ for an hour. An investigation of the crystalline orientation and surface morphology evolution of the annealed W thin films suggests that the.change of film texture coefficient T110 depends on the competition between the strain and surface energy. The surface structure evolution of annealed W thin films of different thickness reflects the competition between the strain energy and the surface energy. In addition, the correlation between the texture coefficient T110 and the surface structure anisotropy of the thin films is established by an approach of integrating the discrete wavelet transform and fractal geometry concepts.

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