中文摘要：

第一次，铜的质地和从硝酸铜答案生产的 Cu-ZrB_2 涂层被学习。氯化物离子在直接电流(DC ) 和脉搏水流(PC ) 条件下面在存款质地上显示出不同效果。铜存款是强烈在有或没有氯化物离子的 DC plating 的 【220】textured。当时处于 PC 状况，当氯化物离子集中超过 20 mg/l，占优势的质地从 【220】 变到 【200】 。ZrB_2particles 的增加提高铜免职的 cathodic，它改进生长(111 ) 飞机。然而，这改进能被氯化物离子的进一步的增加消除。

英文摘要：

For the first time, the texture of copper and Cu-ZrB2 coatings produced from copper nitrate solution was studied. Chloride ion shows different effects on the deposit texture under direct current （DC） and pulse current （PC） conditions. Copper deposits are strongly 〈220〉 textured in DC plating with and without chloride ion. While in PC condition, the predominant texture shifts from 〈220〉 to 〈200〉 as the chloride ion concentration exceeds 20 mg/l. The addition of ZrB2 particles enhances the cathodic polarization of copper deposition, which improves the growth of （111） plane. However, this improvement can be eliminated by further addition of chloride ion.