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中文摘要：
采用溶胶凝胶协同自组装与光刻相结合的方法,在光子晶体反蛋白石结构中引入缺陷,通过溶胶凝胶协同自组装方法在硅片上垂直沉积胶体晶体复合薄膜,把BP212正性光刻胶均匀旋涂在复合薄膜上,通过曝光、显影等光刻工艺,把掩膜版图案复制在复合薄膜上,用此样品再次垂直沉积一层复合薄膜,使图案被复合薄膜覆盖.最后去除胶体微球与光刻胶图案,从而在反蛋白石结构中引入缺陷,用扫描电子显微镜对样品进行表征.分析了光刻胶图案对胶体微球排列的影响.
英文摘要：
By applying planar lithography and sol-gel co-assembly methods, the designed two-dimensional defects were introduced in inverse opal films. Composite colloidal crystal films which can turn into inverse opal films after calcination were fabricated by sol-gel co-assembly method. Photoresist patterns produced by planer lithograph either on silicon or composite colloidal film/silicon substrate were used as the sacrificial structure to form the designed defects. To form the embedded defects in inverse opal films, a layer of composite colloidal crystal film was assembled on the photoresist patterns. After calcination, both PS spheres and photoresist were removed, and the designed defects were introduced in the inverse opal films. Infiuence of the photoresist patterns on self-assembled PS particles was also characterized.
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