中文摘要：

为了制备高输出功率的441．6nm氦-镉激光反射镜，研究了氧离子束辅助工艺及退火后处理对ZrO2单层膜及441．6nm氦-镉激光器ZrO2／SiO2反射膜的影响。利用紫外-可见分光光度计测试了薄膜样品的反射光谱及吸收光谱；通过原子力显微镜测试了薄膜表面的粗糙度。测量及分析结果表明：氧离子束辅助沉积能够提高激光反射镜的反射率并形成致密的薄膜结构，但是由于引入的杂质缺陷提高了薄膜的吸收率从而使得激光的输出功率变小；退火处理消除了吸附于薄膜表面的杂质气体、水分，输出功率相比于退火前有了大幅度的提高。

英文摘要：

Aiming to manufacture high output power of high reflective mirror, the influence of 02 ion-beam assistance and annealing treatment to Zr02 films and ZrO2/SiO2 high reflection films used for 441.6 nm He-Cd laser is studied. The effects of different deposition processes and post-treatment on the optical and roughness of the samples are characterized by ultraviolet-visible spectrophotometer and atomic force microscopy, respectively. The results show that 02 ion-beam assisted deposition increases the reflectivity and form a dense film structure, but the output power of laser is smaller due to the introduction of impurity defects to improve the absorption rate of film; the output power of annealed films has been improved significantly than films without annealing while impurity gas and water on film surface are eliminated.