中文摘要：

随着超大规模集成电路的发展,高浓度臭氧水溶液产生设备成为硅片清洗的关键设备。因此大连海事大学环境工程研究所研制成功国内首台dho3l系列高浓度臭氧水溶液设备,它的臭氧水浓度达到20～30 mg/L。该设备采用强电场电离放电方法,将O2和H2O电离成高浓度氧活性粒子O2＋、O3、O（1D）、O（3P）和引发剂HO2–,在引发剂HO2–作用下,O3与H2O生成高浓度臭氧水溶液。它具有臭氧水浓度高、自动化程度高、能耗低、体积小、高性价比等特点,并着重阐述了该设备的技术先进性及性能指标。

英文摘要：

With the development of ultra large scale integrated circuits,High Dissolved Ozone water is the key of Silicon Wafer Cleaning.Therefore,The China＇s first High Dissolved Ozone Water Device of dho3l with dissolved ozone concentration up to 20～30 mg/L has successfully developed by Dalian Maritime University Environmental Engineering Research Institute.The devices uses strong electric field ionization discharge method,O2 and H2O is ionized in active oxygen species O2＋、O3、O（1D）、O（3P） and initiator HO2–.Under the initiator HO2–,O3 react with H2O to product high dissolved ozone water.The devices have high dissolved ozone concentration,high degree of automation,low energy consumption,small volume,high performance-price ratio,ect..The paper describes the advanced technology and performance of the devices of dho3l.