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Pressure-DependentEtching Mechanism and Induced Dielectric Properties Variation of BZN Thin Filmsin
  • ISSN号：0272-4324
  • 期刊名称：Plasma Chemistry and Plasma Processing
  • 时间：2015.11.10
  • 页码：1119-1127
  • 相关项目：铁电薄膜微图形化及其电性能相关性研究
作者： 戴丽萍|
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铁电薄膜微图形化及其电性能相关性研究
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