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中文摘要：
为解决850 nm波长VCSEL表面的Ga As/空气材料的高对比亚波长光栅(HCGs)稳定性差的问题,设计了基于Si/Si O2材料的高对比亚波长光栅。研究了850 nm波长高稳定、高反射率(>99.5%)的高对比亚波长矩形光栅参数的变化对反射率的影响。利用有限元分析软件计算了Si/Si O2高对比亚波长光栅的高度、填充因子、周期、刻蚀深度及光栅倾角等各个参数的变化对850 nm的反射率影响。计算结果表明:当波长为850 nm的TE光从Si O2正入射到矩形HCGs且只有在光栅的倾角大于88°的小范围内变化时,HCGs的反射率才大于0.995,而光栅的其他参数对HCGs反射率的影响可以忽略不计。
英文摘要：
In order to solve the problem of poor stability of high contrast gratings ( HCGs) for 850 nm VCSEL, a new type of Si/SiO2 HCGs was put forward. The influence of grating parameters on HCG reflectivity of 850 nm was studied. The influence of the grating parameters, such as height, fill factor, duty, etching depth, angle, on the reflectivity of Si/SiO2 HCGs for 850 nm was simulated and analyzed by the finite element analysis software. For the 850 nm TE light incidence from SiO2 to the rectangular HCGs, it is found that only when the angle of gating is greater than 88°, can the re-flectivity of HCGs be greater than 0. 995, and other parameters of HCGs have a larger tolerance.
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