采用 SEM、XRD 和 Raman 光谱法研究电场作用下含铬溶液中铅基阳极氧化膜的残余内应力行为、内应力形成, 讨论了氧化膜内应力产生过程与氧化膜表面形貌、物质结构转变的关系。结果表明, 在氧化膜形成初期, Cr2O72-和 HCrO4-离子首先吸附在铅基阳极表面, 电场作用下, 其与铅基体反应并分别形成 PbCrO4和 PbO,同时产生较大内应力。电流密度的增加, 显著提高氧化膜的内应力。随着氧化时间的延长, 阳极析氧行为的加剧,促进 PbO 或 β-PbO2形成。同时, 晶粒长大与内应力的不匹配, 导致内应力局部释放, 表现出氧化膜残余内应力减小。铅基氧化膜中不同氧化物组织结构的晶格参数差异, 增加了氧化膜内应力梯度变化, 致使氧化膜破裂。
Mechanism of residual stresses generated in anodic oxidized film on lead alloy substrate was investigated us- ing CrO3 solution with the influence of electric field. The stresses formation process, their relationship with surface mor- phology and structure of oxidation film were discussed in details based on the results of SEM, XRD and Raman tests. It is indicated that Cr2O72 and HCrO4 ions are absorbed on lead alloy surface in the initial formation process of oxidation film Then PbCrO4 is formed on the interface of Cr2O72 and Pb. HCrO4- oxidizes Pb into PbO under electric field. At the same time, the stresses are generated gradually in the oxide film and increase quickly with current density increase. However, enhanced oxygen evolution promotes the formation of PbO or 13-PbO2 with the increase oxidation time. Meanwhile, the growth of crystalline grain for lead oxides is believed to be mismatched with the developing inner stresses, releasing inner stresses, which lead to residual stresses decreasing in oxidation film. The film is cracked because stresses gradient in- creases remarkably in oxidized film due to the crystal lattice difference in different lead oxides.