中文摘要：

简述了化学气相沉积技术（Chemical Vapor Deposition，简称CVD）的发展历程及其应用领域；重点阐述CVD技术在难熔金属（W、Re、Ta、Mo、Nb）相关领域的应用概况并展望了其研究前景，特别指出CVD技术在制备难熔金属合金研究上存在的挑战和机遇。

英文摘要：

A brief overview of the development process and application areas of the Chemical Vapor Deposition （CVD） was presented.The emphasis was on the applications of the CVD technology in the refractory metal-related fields as well as the research prospect, and it was noted that the opportunity goes with the challenge in studying refractory metal alloys prepareted by CVD technology.