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Defocusing role in femtosecond filamentation: Higher-order Kerr effect or plasma effect
  • ISSN号:1674-1056
  • 期刊名称:《中国物理B:英文版》
  • 时间:0
  • 分类:O53[理学—等离子体物理;理学—物理] TN24[电子电信—物理电子学]
  • 作者机构:[1]Institute of Atomic and Molecular Physics,Jilin University, Changchun 130012, China, [2]Jilin Provincial Key Laboratory of Applied Atomic and Molecular Spectroscopy (Jilin University), Changchun 130012, China
  • 相关基金:Project supported by the National Basic Research Program of China (Grant No. 2013CB922200), the National Natural Science Foundation of China (Grant Nos. 11034003 and 11474129), the Research Fund for the Doctoral Program of Higher Education in China (Grant No. 20130061110021), and the Graduate Innovation Fund of Jilin University, China (Grant No. 2015091).
中文摘要:

The femtosecond filamentation in the classical and high-order Kerr(HOK) models is numerically investigated by adopting multi-photon ionization(MPI) cross section with different values. It is found that in the case that the MPI cross section is relatively small, there exists a big difference between the electron density as well as clamped intensity calculated in the classical model and those calculated in the HOK one, while in the case that the MPI cross section is relatively large, the electron density and clamped intensity calculated in the two models are nearly in agreement with each other, and under this circumstance, even if the higher-order nonlinear terms do exist, the free-charge generation and the associated defocusing in a filament are enough to mask their effects. The different behaviors of the maximum intensity and on-axis electron density at the collapse position with the pulse duration provides an approach to determine which effect plays the dominant defocusing role. These results demonstrate that it is ionization that results in the difference between the two models.

英文摘要:

The femtosecond filamentation in the classical and high-order Kerr (HOK) models is numerically investigated by adopting multi-photon ionization (MPI) cross section with different values. It is found that in the case that the MPI cross section is relatively small, there exists a big difference between the electron density as well as clamped intensity calculated in the classical model and those calculated in the HOK one, while in the case that the MPI cross section is relatively large, the electron density and clamped intensity calculated in the two models are nearly in agreement with each other, and under this circumstance, even if the higher-order nonlinear terms do exist, the free-charge generation and the associated defocusing in a filament are enough to mask their effects. The different behaviors of the maximum intensity and on-axis electron density at the collapse position with the pulse duration provides an approach to determine which effect plays the dominant defocusing role. These results demonstrate that it is ionization that results in the difference between the two models.

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期刊信息
  • 《中国物理B:英文版》
  • 中国科技核心期刊
  • 主管单位:中国科学院
  • 主办单位:中国物理学会和中国科学院物理研究所
  • 主编:欧阳钟灿
  • 地址:北京 中关村 中国科学院物理研究所内
  • 邮编:100080
  • 邮箱:
  • 电话:010-82649026 82649519
  • 国际标准刊号:ISSN:1674-1056
  • 国内统一刊号:ISSN:11-5639/O4
  • 邮发代号:
  • 获奖情况:
  • 国内外数据库收录:
  • 被引量:406