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Visualizing Topological Insulating Bi(2)Te(3) Quintuple Layers on SiO(2)-Capped Si Substrates and It
  • ISSN号：1533-4880
  • 期刊名称：Journal of Nanoscience and Nanotechnology
  • 时间：2011.8.8
  • 页码：7042-7046
  • 相关项目：1keV/atom以下的团簇离子注入固体极浅表面的过程研究
作者： Wang, Guanghou|Qin, Yuyuan|Mu, Yuewen|Chen, Taishi|Xu, Changhui|He, Longbing|Wan, Jianguo|Song, Fengqi|Zhou, Jianfeng|
同期刊论文项目
1keV/atom以下的团簇离子注入固体极浅表面的过程研究
期刊论文 11
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