中文摘要：

以钨粉过氧化聚钨酸法配制溶胶，采用脉冲电泳沉积和浸渍提拉两种工艺在ITO导电玻璃基底上制备电致变色WO3薄膜，研究溶胶-凝胶成膜工艺对WO3薄膜微观结构、光学性能和电化学性能的影响．结果表明，两种成膜工艺制备的WO3薄膜均呈非晶态，薄膜厚度相近，约为252nm．与浸渍提拉法相比，脉冲电泳沉积制备的薄膜具有更大的光学调制幅度，在可见光范围内可达80％，比浸渍提拉制备的薄膜高25％．脉冲电泳沉积制备的薄膜具有更高的电化学活性和更快的时间响应，但其循环可逆性相对较低．

英文摘要：

A sol made through peroxopolytungstic acid method was employed for the deposition of elec- trochromic WO3 films by pulse electrophoretic depositing and dip coating techniques on ITO glass substrates. Effects of films forming techniques on the microstructure, optical and electrochemical properties of sol - gel derived WO3 films were studied. WO3 films prepared by the two film forming tech-niques are composed of amorphous phase, and both films have similar thickness - 252 nm. The transmission modulation for W03 films prepared by pulse electrophoretic depositing can be up to 80% in the visible region, which is 25% higher than the dip coated films. The pulse electrophoretic deposited WO3 films exhibit higher electrochemical activity, faster response, and relatively lower reversibility compared with the dip coated WO3 films.