针对PSII方法处理圆柱管件内表面过程,利用离子的连续性方程、运动方程和Poisson方程建立了流体力学模型,通过数值模拟研究了磁场对离子注入的相关参数所产生的影响,计算结果表明磁场的作用会降低离子注入能量、剂量并增大离子注入角度,即对离子注入过程会产生不利影响。但是,在磁场强度一定时,这种影响可以通过提高等离子体密度得以降低。
A fluid dynamics model is built by using Poisson's equation and the equations of ion continuity and motion for the inner surface modification of the cylindrical bore by plasma source ion implantation(PSII) in a magnetic field, and the influence of the magnetic field on the parameters of the ion implantation has been investigated numerically in this paper. The simulation results show that the magnetic field increases the ion impact angle, and decreases the ion impact energy and implantation dose, so the magnetic field is not favorable for the inner surface modification of the bore. But it is found that the disadvantageous influence can be decreased by increasing the plasma density when the magnetic field is constant.