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The anomalous Hall effect in epitaxial Fe(110) films grown on GaAs(110)
  • 时间:0
  • 分类:O484.1[理学—固体物理;理学—物理] TN304.11[电子电信—物理电子学]
  • 作者机构:[1]State Key Laboratory of Surface Physics and Department ofPhysics, Fudan University, Shanghai 200433, China
  • 相关基金:Acknowledgments This work was supported by the National Basic Research Program of China (2015CB921400 and 2011CB921802) and the National Natural Science Foundation of China (11374057, 11434003 and 11421404).
中文摘要:

在在 GaAs (110 ) 上种的取向附生的 Fe (110 ) 电影的异常霍尔效果作为电影厚度和温度的功能被调查。996 \ 的果浆导致弯曲的内在的贡献(mega ^{-1}\hbox { 厘米 }^{-1}\) 第一次试验性地被决定。和 821 \( Fe ( 111 )和 1100 \mega ^{ -1}\hbox {厘米}^{在的-1}\)( Fe ( 001 )mega ^{ -1}\hbox {厘米}^{在的-1}\)更早获得了,我们明白地在单个水晶的 Fe 显示出对异常霍尔效果的果浆弯曲贡献的 anisotropy 。

英文摘要:

The anomalous films grown on GaAs(110) Hall effect in epitaxial Fe(110) is investigated as a function of both film thickness and temperature. The Berry curvatureinduced intrinsic contribution of 996 Ω^-1 cm^-1 is determined experimentally for the first time. Together with 821 Ω^-1 cm^-1 in Fe(111) and 1100 Ω^-1 cm^-1 in Fe(001) obtained earlier, we show unambiguously the anisotropy of the Berry curvature contribution to the anomalous Hall effect in single-crystal Fe.

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