以较低温度烧结获得的PMN—PT块材料为靶,采用脉冲激光沉积方法在石英衬底上制备了PMN—PT薄膜,研究了后续退火处理对PMN—PT薄膜的结构及光学特性的影响.结果显示,采用脉冲激光沉积可获得质量较好的钙钛矿结构的PMN—PT薄膜,优化的后续退火温度大约在550℃~750℃之间.
The target of PMN-PT is sintered under low temperature. The PMN PT thin films are grown on quartz substrates using pulsed laser deposition. The influence of the annealed temperature on the structural and optical characterizations for the PMN PT thin films is studied. The results show that the PMN-PT thin films of perovskite structure have been formed, and the quality of PMN-PT thin films can be improved in the annealed temperature range of 550-750℃.