以单丁基三氯化锡、氟化铵、无水甲醇、超纯水为原料制备反应热喷涂液,采用高温喷雾裂解工艺在玻璃基底上制备氟掺杂氧化锡(FTO)透明导电薄膜,研究了氟掺杂浓度对所制备FTO透明导电薄膜光、电性能的影响.研究结果表明,制备透明导电薄膜的最佳工艺参数为:基底温度500 ℃、掺杂浓度24 atom%、锡前体浓度0.5 M、喷涂次数60次及醇水比2 :1,对应的透明导电玻璃方块电阻Rsh=11.3 Ω/sqr,可见光区平均透光率Tave=77.80%,品质因数ФTC=7.2×10^-3/Ω,评估指标均接近商品级别.
Fluorine doped tin oxide film (FTO) was deposited by using spray pyrolysis strategy on glass substrate with monobutyltintrichloride, ultrapure water and methanol mixing solution as raw materials, and NH4F as a dopant. The effect of NH4F concentration inprecursor solution on the photoelectric properties of the as-prepared conductive film was studied. The experimental results reveal that the bestoperating parameters are as follows: the temperature of the substrate is controlled at 500°C, the concentration of NH4F is fixed at 24 atom%in 0.5 M Sn precursor solution (Vmethanol : Vwater=2 : 1), and the spray procedure is conducted for 60 times. Finally, the sheet resistance (Rsh=11.3Ω/sqr), visible average-transmittance (Tave=77.80%) and figure of merit (ФTC = 7.2×10^-3 /Ω) of the conductive film can be realized, all of whichare very close to those of the commercial FTO.