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Influence of rapid thermal annealing temperature on structure and electrical properties of high perm
  • ISSN号：0026-2714
  • 期刊名称：Microelectronics Reliability
  • 时间：0
  • 页码：-
  • 相关项目：钛氮共掺氧化铪栅介质薄膜的界面抑制和性能调控
作者： Cong Ye|Chao Zhan|Jieqiong Zhang|Hao Wang|Tengfei Deng|Shiruo Tang|
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钛氮共掺氧化铪栅介质薄膜的界面抑制和性能调控
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