利用射频磁控溅射制备了TiO_2致密薄膜,并通过退火实现TiO_2的相转变,采用扫描电镜,X射线衍射等手段对薄膜相结构进行表征并做了详细的分析。结果表明,退火后TiO_2薄膜结构致密,表面呈现出大小均匀的纳米晶粒。400℃退火时,TiO_2薄膜为单一的锐钛矿相,500~600℃退火时为锐钛矿和金红石混合相,700℃以上退火时则完全转变为金红石相。
TiO2 thin films were prepared by using RF magnetron sputtering and achieved a phase transition of TiO2 by annealing treatment. Phase structure of the thin films were characterized and analyzed by means of SEM and XRD. The results show that the TiO2 thin films structure is compact and exhibits uniform nanocrystals on surface. The crystal of the TiO2 film is anatase phase after annealed at 400 ℃, mixed anatase and rutile phase after annealed at 500-600 ℃ and completely transformed into the rutile phase after annealed above 700 ℃.