采用射频磁控溅射法在本征(100)Si片上和CVD金刚石膜上制备了立方(222)择优取向的Y2O3薄膜,应用AFM观察薄膜的三维形貌表明薄膜表面晶粒致密,缺陷较少,表面粗糙度为8.7nm;TEM表征薄膜微观结构,表明薄膜为柱状晶结构,柱状晶宽度10~20nm,而且晶界明显,部分较大晶粒中存在些许位错缺陷;纳米力学探针和划痕仪表征薄膜的力学性能,表明薄膜硬度为20.73GPa,弹性模量为227.5GPa,可作为金刚石膜的抗氧化保护膜,并且与金刚石膜的结合较好,结合力约为5N;FTIR对薄膜的光学性能进行分析,表明双面立方Y20,薄膜对金刚石膜的最大增透为23%,基本符合Y2O3的理论增透效果。
Y2O3 thin film of cubic (222) preferred orientation was deposited on intrinsic (100) Si and polished freestanding CVD diamond by the RF magnetron method. The result of AFM analysis indicate that the film was dense and smooth, and the surface roughness was 8.7 nm. The result of TEM analysis show that the grains of the film were columnar crystals whose width ranged from 10 nm to 20 nm; the grain boundary was obvious and there was a little defects in the big grains. Mechanical properties of the thin films was tested by nano-indentation and scratch tester. The results showed that hardness of the film was 20.73 GPa while the elastic modulus was 227.5 GPa, and it could be used as antioxidant protective film of diamond film and the binding force of the film and the diamond film was 5 N. The analysis of the optical properties of the thin films by FTIR showed that the maximum IR transmittance of the preferred Y2O3 to the diamond film was 23%, which was basically consistent with the theoretical infrared anti reflection effect.