中文摘要：

通过建立通电线圈磁场的数学模型,采用FORTRAN语言自主编程,对磁控溅射靶附近由通电线圈产生的磁场分布进行了二维数值模拟计算。计算结果表明,当内、外线圈加反向电流,加大内或外线圈电流,可使线圈产生的磁场非平衡度增加。通过调节内、外线圈电流,控制磁场分布,而增加内或外线圈电流则可使真空腔内磁场强度分布更加均匀,从而控制了等离子体密度及能量分布,使等离子体在真空腔内分布均匀化。另外,这种外加的电磁场还会使磁控装置本体磁场增强,对磁控溅射产生的等离子体起到增强作用。此结果为磁控溅射装置上磁场配置提供重要参考依据。

英文摘要：

FORTRAN computer programming language is used to establish the mathematical models in this paper. The numerical simulation of the two-dimensional distribution of the magnetic field produced by hot-wire coil,which is located under the target,is carried out. The result of the calculation shows that the magnetic field unbalance degrees increase as the increasing of the currents in the inner or outer coils when the reverse currents are applied. The distribution of the magnet fields can be controlled by regulating the inner or outer coil currents,while increasing the inner or outer coil currents can make the distributions of the magnetic field in the vacuum chamber homogeneous. Thereby the density of plasma and the distribution of the energy are under controlled,so that the distribution of the plasma in the vacuum chamber is homogeneous. Additionally,the electromagnetic field also strengthens the permanent magnetic field,which confines and extends the pathways of the electrons and increases the ionization ratios of the plasma. The result provides important reference data for the magnetic field configuration of the magnetron sputtering device.